Search
Advanced Lithography
Wednesday, July 13
10:30am-12:30pm
NorthOne TechXPOT
| Session Sponsor: |  |
|
| Description |
Listen to experts discuss the readiness of EUV lithography for patterning critical layers, including the mask infrastructure. A separate panel will describe direct-write e-beam, and methods to extend 193 nm scanners. |
|
| |
||
| Agenda |
EUV Lithography |
|
| 10:30am-10:40am | |
EUV LPP Sources for High Volume Manufacturing |
|
|
||
| 10:40am-10:50am |  |
EUV DPP Sources, Status and Roadmap
Marc Corthout, Ph.D. (Biography) |
|
|
||
| 10:50am-11:05am |  |
Presentation not available Skip Miller (Biography) |
|
|
||
| 11:05am-11:20am |  |
Stefan Wurm, Ph.D. (Biography) |
| 11:20am-11:30am |
Q&A Moderated by David Lammers |
|
| Extended 193nm and E-beam |
||
| 11:30am-11:45am |  |
Toolbox for Optical Lithography Extension Martin McCallum, Ph.D. (Biography) |
| 11:45am-12:00pm |  |
Frequency Multiplication Technology for 15nm and Below Member, Technical Staff, Office of the CTO Applied Materials |
| 12:00pm-12:15pm |  |
Extending Optical Lithography with CEBL (Complementary E-Beam Lithography) David Lam, Ph.D. (Biography) Chairman and CEO |
| 12:15pm-12:30pm |
Q&A Moderated by David Lammers |
|
 |
|
