Hosted by the Smart Manufacturing Special Interest Group, Americas Chapter
Will EUVL have a prominent role at 5nm? Hints that it will came out of the mid-2017 announcement of the first 5nm gate-all-around chip using EUVL. Many leading-edge semiconductor manufacturers have announced plans to introduce EUVL within the 2018-2019 timeframe. Additionally, papers presented at recent lithography-focused conferences indicated progress in both Extreme Ultraviolet (EUV) tools and process. This session will explore the progress being made in EUVL and its potential for the economics to make sense for HVM. There will also be a discussion of other lithography solutions that can address the march to 5nm and below.