193nm and Hybrid Lithography

Thursday, July 13 11:10am

As the industry prepares for the 7nm and 5nm lithographic nodes, we have come to realize that there is no single solution for lithographic printing at these smaller sizes.  We are presented with a multiplicity of options: 193 immersion, EUV, chemical methods like DSA, and maskless lithography.  None of them will suffice on its own.  In this talk, we'll review the pros and cons of each of the options, consider the technical and cost advantages of each, and propose a way forward.

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