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Addressing Nanodefectivity
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Wednesday, July 10, 2013 |
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| Description |
As device dimensions decrease to less than 20 nm nodes, critical defect size also moves into the nanoscale. The technical challenges of finding, identifying, and removing defects at the nanoscale require new infrastructure investments. In this session, the challenges of new inspection and characterization equipment are coupled to fundamentals of defect generation at the nanoscale to describe the integrated nanodefect problem and solutions to enable future semiconductor industry yield enablement. |
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