Si2 Workshop
DFM Standards: Driving Design Ecosystems from PDK's to Manufacturing


Wednesday, July 13


Room 124, Lower North Hall Lobby

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Description The complexity of rules and processes needed to ensure the manufacturability of ICs is increasing rapidly with every new technology node. It is also quite apparent that many of the issues involving Design for Manufacturability (DFM) and Process Design Kits (PDK’s) and are interrelated and can be greatly simplified, if not eliminated, by standardized industry practices. This workshop will highlight those interrelated standards and showcase the ongoing work being done by industry leaders in solving these problems.

There are parallel and synergistic efforts at Si2 in the development of standards to represent verification methods for DFM and the content of PDKs. These efforts have yielded exciting results in 2010 with momentum building in 2011. The presenters will describe the state-of-the-art and elaborate on current and future work in both of these areas including some of the enabling technologies that have been developed to support adoption of the standards. This workshop is targeted at engineers working in these areas and managers who are responsible for investments in PDKs, DFM, and Design Flows.

In the DFM arena, standardization has proceeded along 2 parallel fronts. In physical DFM, a standard high-level DFM verification and optimization language called OpenDFM has been defined to support the needs of manufacturability and PDK generation. Among its many attributes, OpenDFM rules bridge the gap between a layout style that allows only a few, very restricted layout patterns and a style that allows purely arbitrary layouts. On the second front, there is ongoing effort to standardize a common format for representing parasitic information and to better handle manufacturing variability. This has implications in how this data is represented in PDK’s and how they affect the modeling of design parameters for power, timing and SI analysis.

PDKs are the fundamental building blocks for all electronic design. Standardized representation of PDK content and interfaces will offer operating efficiencies to foundries, EDA companies, IP providers and design companies who use the PDK’s, create their own kits or need to modify those that they receive from their foundries. Resultant PDK’s are expected to be more robust and portable than ever before.
Session 1: DFM Standards

2011 OpenDFM Overview – a Customer Perspective

Fred Valente, TI and Si2


Parasitic Extraction Standards and Design for Variability

Concetta Riccobene, LSI


Targeting and Litho Bias

Bob Sayah, IBM and Si2

2:30pm-4:00pm Session 2: Open PDK Standards

2011 OpenPDK Coalition Overview

Linda Fosler, Mentor Graphics


Open Process Spec Progress

Gilles Lamant, Cadence Design Systems




Symbols, CDF, and Callback Progress

Rich Morse, Springsoft



4:00pm-4:30pm Networking Reception
 Free.  Register Now
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