Dr. Mike Chudzik joined Applied Materials in 2014. He manages a cross business unit group responsible for product and process gap analysis and response for channel/device, gate, contact and interconnect modules. Prior to his work with Applied Materials, Dr. Chudzik spent 14 years at IBM (2000-2014). Dr. Chudzik started his career working on high-k dielectrics for DRAM and logic devices. He spent 2 years at IBM’s T.J. Watson Research Center (Yorktown Heights, NY) working on atomic layer deposition (ALD) of high-k and metal gate films.
Since then, Dr. Chudzik has held a number of management positions both within IBM Research and the IBM Systems and Technology Group where he brought high-k/metal gate technology from research into development. Dr. Chudzik is an author or co-author of more than 40 peer-reviewed journal and conference papers, and is an IBM Master Inventor with over 60 patents in the areas of electronic materials, CMOS processing and CMOS device structures. He holds a
B.S. in Metallurgy from the University of Washington and a Ph.D. in Electrical Engineering from Northwestern University.